簡介：
1982年1月 西安交通大學機械工程系熱處理專業(yè)學士
1982年10月 留學日本。
1988年9月在日本東京大學獲工學博士學位，后在日本大阪大學、東京大學等單位工作
1996年 回國在北京科技大學做博士后
1997年 入選中國科學科院“百人計劃”
1998年 到力學所工作
現(xiàn)在主要研究方向：
熱等離子體的產(chǎn)生與狀態(tài)控制、光譜與探針診斷，高溫部分電離氣體射流的穩(wěn)定性與流場測量；
等離子體與材料表面的相互作用及換熱效果，實驗測量與理論分析；
等離子體表層材料制備與改性，包括熱障涂層制備、抗熱沖擊性能檢測、金屬表面熔凝或熔敷強化工藝、薄膜沉積；
冷等離子體薄膜工藝。
過去主要從事過鑄鐵的離子滲氮、高頻與直流疊加的熱等離子體CVD法制備陶瓷納米粉、低氣壓弧光等離子體燒結(jié)、等離子體噴涂、等離子體材料表面改性、金屬與陶瓷的接合及其界面、熱等離子體CVD制備大面積金剛石膜，以及直流大氣壓層流等離子體射流產(chǎn)生、磁擴弧等離子體發(fā)生器研制等方面的研究。
代表論著：
# W.X.Pan,, X.Meng, and C.K.Wu, “Laminar plasma jets: generation, characterization and applications for material surface processing”, Pure Appl. Chem., 77(2) 2005, 373-378.
# W.X.Pan, X.Meng, Q.X.Fei and C.K.Wu, “Feasibility of laminar plasma-jet hardening of cast iron surface”, Surface & Coatings Technology, (2005).
# G. Li, W.X.Pan, X.Meng and C.K.Wu, “Application of Similarity Theory to the Characterization of Non-transferred Laminar Plasma Generation”, Plasma Sources Sci. Technol., 14 (2005) 219-225.
# , W.X.Pan and C.K.Wu, “Preliminary Investigations on Low-Pressure Laminar Plasma Spray Processing”, Surface & Coatings Technology, 191(2005)166-174.
# W. X. Pan, W. H. Zhang, W. Ma and C. K. Wu，Characteristics of argon laminar DC plasma jet at atmospheric pressure，Plasma Chemistry and Plasma Processing, 22 [2], 271-283, 2002.
# W.X.Pan, W.H.Zhang, W.H.Zhang, and C.K.Wu, “Generation of Long, Laminar Plasma Jets at Atmospheric Pressure and Effects of Flow Turbulence”, Plasma Chemistry and Plasma Pro-cessing, 21(1),2001, 23-35.
# W.X.Pan, F., W.Z.Tang, G.F.Zhong, Z.Jiang and C.K.Wu, “Carbon transition efficiency and process cost in high-rate, large-area deposition of diamond films by DC arc plasma jet”, Diamond and Related Materials, 9, 1682-1686, 2000.
# W.X.Pan, T.Okamoto and X.S.Ning, “Joining of Al-plasma-sprayed Si3N4 ceramics”, J. Mater. Sci., 29, 1436-1440. (1994).
# W.X.Pan, T.Okamoto, Y.Miyamoto, X.S.Ning, H.Matsumoto and T.Yoshida, “Plasma spray deposition of fine SiC powder”, J. Am. Ceram. Soc., 76 [5] 1335-1339 (1993).
# W.X.Pan, H.Sato, T.Yoshida and K.Akashi, “Plasma sintering of ultrafine amorphous Si3N4”, Advaced Ceramic Materials (J. Am. Ceram. Soc.), 3[1] 77-79 (1988).
* W.X.Pan, W.H.Zhang, and C.K.Wu, “Generation and characterization of laminar-flow DC plasma jet at atmospheric pressure”, 5th Asia-Pacific Conf. On Plasma Sci. & Tech., Dalian, Sep. 10-13, 2000, pp.O-04, Invited topic.
* W. X. Pan and C. K. Wu，Vacuum plasma spray for high quality TBC，JSPS Inter. Symp. on Thermal Plasma Deposition, Tokyo , Jan. 28, 2002, ed. by T. Yoshida, etc., pp.29-35, Invited.
* W. X. Pan, G. Li, X. Meng, C. K. WU, “Laminar plasma jets: generation, characterization and applications for material surface processing”, In the proceedings of ISPC-16, Taormina, Italy, 2003, P. 247. (Invited)
* Wen-Xia Pan, Xian Meng, Kai Cheng, Dong-Yan Xu, Xi Chen, Cheng-Kang Wu. Flow field comparison of laminar and turbulent DC arc plasma jets. 7th Asia Pacific Conference on Plasma Science and Technology, June 29 u2013 July 2, 2004, Fukuoka, Japan. P. 67. (Abstract; Invited).
承擔科研項目情況：
參見 工程科學研究部 等離子體與材料工藝力學組信息